Method for fabricating a circuit device

Details Method for fabricating a circuit device Method for fabricating a circuit device

2005-04-26

2005-04-26

Trinh, Minh (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S843000, C029S842000, C029S841000, C029S832000, C029S852000, C438S126000

Reexamination Certificate

active

06883231

ABSTRACT:
A method for fabricating a circuit device includes preparing an insulation resin sheet for which a first conductive layer and a second conductive layer are adhered to each other by insulation resin, forming through holes in the first conductive layer and the insulation resin at appointed points of the insulation resin sheet, and selectively exposing the rear side of the second conductive layer. A multi-layer connecting means is formed in the through holes and the first conductive layer is electrically connected to the second conductive layer. The method includes etching the first conductive layer to an appointed pattern, forming a first conductive path layer, and adhering and fixing semiconductor elements by electrically insulating the same on the first conductive path layer. The first conductive path layer and the semiconductor elements are overcoated with a sealing resin layer. The second conductive layer is etched to an appointed pattern after etching the entire surface thereof so as to become thin, and forming a second conductive path layer. External electrodes are formed at appointed points of the second conductive path layer.

REFERENCES:
patent: 5832600 (1998-11-01), Hashimoto
patent: 6119335 (2000-09-01), Park et al.
patent: 6664138 (2003-12-01), Igarashi et al.
patent: 6720209 (2004-04-01), Igarashi et al.

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