Method for fabricating a mask configuration

Details Method for fabricating a mask configuration Method for fabricating a mask configuration

2005-05-10

2005-05-10

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S322000, C430S323000

Reexamination Certificate

active

06890689

ABSTRACT:
During the fabrication of a mask, to substantially avoid systematic deviations from a desired configuration of recesses that will be formed in the mask, the patterning of the mask substrate is carried out in a sequence of subprocesses. The subprocesses are matched to one another such that the deviations that are formed from these subprocesses compensate for one another, so that in this way, error correction is achieved.

REFERENCES:
patent: 6453274 (2002-09-01), Kamon
patent: 6492073 (2002-12-01), Lin et al.
patent: 6534242 (2003-03-01), Sugita et al.
patent: 6677088 (2004-01-01), Magome et al.

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