Exposure apparatus and methods utilizing plural mask and...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S067000, C355S075000, C250S548000

Reexamination Certificate

active

06894763

ABSTRACT:
A mask stage RS1and a substrate stage WS1are synchronously moved, and a mask stage RS2and a substrate stage RS2are synchronously moved, in a state in which a mask on the mask stage RS1and a mask on the mask stage RS2are irradiated with illumination light beams from illumination optical systems IOP1, IOP2respectively. The reaction force on a base board due to the movement of the stages can be canceled to suppress the vibration of an exposure apparatus by moving the mask stage RS1and the mask stage RS2in mutually opposite directions. The throughput can be improved by performing alignment operation on substrate stages WS3, WS4concurrently with the exposure operation.

REFERENCES:
patent: 4458994 (1984-07-01), Jain et al.
patent: 4653903 (1987-03-01), Torigoe et al.
patent: 4734746 (1988-03-01), Ushida et al.
patent: 4769680 (1988-09-01), Resor, III et al.
patent: 4780617 (1988-10-01), Umatate et al.
patent: 4878086 (1989-10-01), Isohata et al.
patent: 4924257 (1990-05-01), Jain
patent: RE33836 (1992-03-01), Resor, III et al.
patent: 5191374 (1993-03-01), Hazama et al.
patent: 5194893 (1993-03-01), Nishi
patent: 5220454 (1993-06-01), Ichihara et al.
patent: 5285236 (1994-02-01), Jain
patent: 5307207 (1994-04-01), Ichihara
patent: 5383217 (1995-01-01), Uemura
patent: 5448332 (1995-09-01), Sakakibara et al.
patent: 5473410 (1995-12-01), Nishi
patent: 5473424 (1995-12-01), Okumura
patent: 5477304 (1995-12-01), Nishi
patent: 5504407 (1996-04-01), Wakui et al.
patent: 5506684 (1996-04-01), Ota et al.
patent: 5534970 (1996-07-01), Nakashima et al.
patent: 5581075 (1996-12-01), Naraki et al.
patent: 5646413 (1997-07-01), Nishi
patent: 5677758 (1997-10-01), McEachern et al.
patent: 5686997 (1997-11-01), Shirasu
patent: 5691802 (1997-11-01), Takahashi
patent: 5715064 (1998-02-01), Lin
patent: 5721605 (1998-02-01), Mizutani
patent: 5933216 (1999-08-01), Dunn
patent: 5969441 (1999-10-01), Loopstra et al.
patent: 6023068 (2000-02-01), Takahashi
patent: 6262794 (2001-07-01), Miyajima
patent: 6262796 (2001-07-01), Loopstra et al.
patent: A-56-49138 (1954-02-01), None
patent: A-57-183031 (1982-11-01), None
patent: A-2-297919 (1990-12-01), None
patent: A-2-297920 (1990-12-01), None
patent: A-2-310912 (1990-12-01), None
patent: A-3-49213 (1991-03-01), None
patent: A-9-312255 (1997-12-01), None
patent: WO9824115 (1998-06-01), None
patent: WO 9840791 (1998-09-01), None

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