Micro devices manufacturing method comprising the use of a secon

Details Micro devices manufacturing method comprising the use of a secon Micro devices manufacturing method comprising the use of a secon

1995-06-01

1997-02-11

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430312, 430313, 430394, 356399, 356401, G03F 900

Patent

active

056019572

ABSTRACT:
An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.

REFERENCES:
patent: 5334466 (1992-10-01), Yasui et al.

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