Method of cleaning substrate

Details Method of cleaning substrate Method of cleaning substrate

2005-09-20

2005-09-20

Markoff, Alexander (Department: 1746)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S001300, C134S002000, C134S026000, C134S030000, C134S902000

Reexamination Certificate

active

06946035

ABSTRACT:
Dirt, particularly of inorganic matter, attached to a substrate, such as a glass substrate for liquid crystal devices, is effectively removed by irradiating the substrate with ultraviolet rays including 184.9 nm and 253.7 nm in an oxygene-containing atmosphere in advance of wet cleaning with pure water. As a result, the wet cleaning time and the amount of pure water can be reduced.

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