Method of separating a template from a substrate during...

Electrical generator or motor structure – Non-dynamoelectric – Piezoelectric elements and devices

Reexamination Certificate

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C101S463100, C430S320000

Reexamination Certificate

active

06870301

ABSTRACT:
Processes and associated devices for high precision positioning of a template an substrate during imprint lithography includes a calibration system with a course calibration stage and a fine orientation stage capable of maintaining a uniform gap between the template and substrate. The fine orientation stage includes a pair of flexure members having flexure joints for motion about a pivot point intersected by first and second orientation axes. Actuators lengthen or shorten to expand or contract the flexure members. Separation of the template is achieved using a peel-and-pull method that avoids destruction of imprinted features from the substrate.

REFERENCES:
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patent: 6696220 (2004-02-01), Bailey et al.
patent: 20020094496 (2002-07-01), Choi et al.
patent: 58-129074 (1983-08-01), None
patent: 4-70379 (1992-05-01), None
Feldman et al., “Wafer Chuck for Magnification correction in X-ray Lithography,” Journal of Vacuum Science and Technology, Nov./Dec. 1998, pp. 3476-3479, vol. B 16(6).

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