Structure of phase shifting mask

Details Structure of phase shifting mask Structure of phase shifting mask

2005-03-15

2005-03-15

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06866967

ABSTRACT:
A phase shifting mask is disclosed in this present invention. The above-mentioned phase shifting mask comprises a quartz layer and a plurality of transmission adjustor layer onto the quartz layer. By employing the above-mentioned phase shifting mask, the material of the transmission adjustors has not to be changed with the light source. Furthermore, the contrast of the phase shifting mask of this invention is better than the contrast of the binary mask and the half-tone mask in the prior art. Therefore, this invention provides a more efficient mask, and the phase shifting mask according to this present invention can improve the resolution in photolithography.

REFERENCES:
patent: 5330862 (1994-07-01), Tabuchi et al.
patent: 6096457 (2000-08-01), Pierrat

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