Dose monitoring method and manufacturing method of...

Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement

Reexamination Certificate

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C430S311000

Reexamination Certificate

active

06919153

ABSTRACT:
There is disclosed a dose monitor method comprising illuminating a mask with illumination light, which is disposed in a projection exposure apparatus and in which a dose monitor pattern is formed, passing only a 0th-order diffracted light through a pupil surface of the projection exposure apparatus in diffracted lights of the dose monitor pattern, and transferring a 0th-order diffracted light image of the dose monitor pattern onto a substrate to measure dose, wherein during the illuminating, a center of gravity of the 0th-order diffracted light image passed through the dose monitor pattern on the pupil surface of the projection exposure apparatus is shifted from an optical axis of the projection exposure apparatus.

REFERENCES:
patent: 6226074 (2001-05-01), Fujisawa et al.
patent: 6251544 (2001-06-01), Inoue et al.
patent: 6376139 (2002-04-01), Fujisawa et al.
patent: 6416913 (2002-07-01), Suzuki
patent: 2003/0219655 (2003-11-01), Sutani et al.
patent: 2004/0265713 (2004-12-01), Shiobara et al.
Starikov; “Exposure Monitor Structure”, SPIE vol. 1261, Integrated Circuit Metrology, Inspection, and Process Comtrol IV, pp. 315-324, (1990).
Fujisawa et al.; “Method of Manufacturing Semiconductor Device”, U.S. Appl. No. 10/107,246, filed Mar. 28, 2002.
Sutani et al.; “Focus Monitoring Method, Exposure Apparatus, and Exposure Mask”; U.S. Appl. No. 10/052,527, filed Jan. 23, 2002.

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