Projection exposure system for microlithography and method...

Details Projection exposure system for microlithography and method... Projection exposure system for microlithography and method...

2005-09-27

2005-09-27

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

06950174

ABSTRACT:
A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.

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