Chemistry of inorganic compounds – Halogen or compound thereof – Binary compound containing metal
Patent
1995-10-31
1997-02-11
Box, Steven
Chemistry of inorganic compounds
Halogen or compound thereof
Binary compound containing metal
423101, C01B 900, C01G 1300
Patent
active
056017952
ABSTRACT:
This invention is directed to a novel method for purifying calomel (Hg.sub.2 Cl.sub.2). More particularly, this invention pertains to a novel process for treating impure calomel (Hg.sub.2 Cl.sub.2) to produce a highly purified calomel product that passes American Chemical Society requirements for calomel assay and mercuric chloride contamination. A process for treating impure calomel to produce purified calomel comprising: (a) incorporating impure calomel into an aqueous slurry; (b) oxidizing the aqueous slurry with an oxidizing agent to form soluble mercuric chloride; (c) filtering the aqueous slurry containing soluble mercuric chloride into liquid and solid components; (d) heating the liquid component to greater than 70.degree. C; (e) treating the liquid component with a reducing agent to precipitate purified calomel; and (f) separating the precipitated purified calomel from the filtrate.
REFERENCES:
patent: 740855 (1903-10-01), Von Hoessle
patent: 1809449 (1931-06-01), Lindsay
patent: 2570408 (1951-10-01), Van Gorder et al.
patent: 3704103 (1972-11-01), Barta
patent: 3849267 (1974-11-01), Hilgen et al.
patent: 4640751 (1987-02-01), Dyvik et al.
patent: 4729882 (1988-03-01), Ide et al.
patent: 5013358 (1991-05-01), Ball et al.
patent: 5071475 (1991-12-01), Barreau et al.
Ball Donald L.
Varley Richard S.
Box Steven
Cominco Ltd.
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