Method for estimating repair accuracy of a mask shop

Details Method for estimating repair accuracy of a mask shop Method for estimating repair accuracy of a mask shop

2005-01-25

2005-01-25

Mathews, Alan (Department: 2851)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237300, C430S005000

Reexamination Certificate

active

06847445

ABSTRACT:
The present invention provides a method for estimating repair accuracy of a mask shop. The method comprises the steps of providing a mask having a light-shielding layer with a pattern of a plurality of lines, each of which has a defect, using the mask shop to repair the defects. Contaminated areas are formed in the vicinity of areas where the defects are repaired, measuring first light intensities of the contaminated areas, and second and third light intensities of two sides of the contaminated areas, and calculating ratios of means of the second and third light intensities to the first light intensities to estimate the repair accuracy.

REFERENCES:
patent: 6023328 (2000-02-01), Pierrat
patent: 6076465 (2000-06-01), Vacca et al.
patent: 6114073 (2000-09-01), Yang
patent: 6297879 (2001-10-01), Yang et al.
patent: 6322935 (2001-11-01), Smith
patent: 6335129 (2002-01-01), Asano et al.
patent: 6381356 (2002-04-01), Murakami et al.

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