Method for fabricating a silicon thin-film

Details Method for fabricating a silicon thin-film Method for fabricating a silicon thin-film

2005-01-25

2005-01-25

Beck, Shrive P. (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

C427S552000, C427S553000, C427S256000, C427S271000, C427S272000, C427S282000

Reexamination Certificate

active

06846513

ABSTRACT:
Provided is a method of forming a silicon thin-film which comprises a step of arranging in one or more parts of a liquid arranging surface liquid which contains a silicide comprising ring silane and/or a derivative thereof, such ring silane comprising silicon and hydrogen, and a step of forming a silicon thin-film by vaporizing silicide from liquid and supplying the silicide to a thin-film-forming surface.

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