Exposure method and apparatus

Details Exposure method and apparatus Exposure method and apparatus

2005-01-11

2005-01-11

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000, C355S071000, C250S548000, C430S311000

Reexamination Certificate

active

06842224

ABSTRACT:
An exposure method illuminates a mask that forms a desired pattern and an auxiliary pattern smaller than the desired pattern, and projects light from the mask onto an object to be exposed via a projection optical system at a position offset from a focus position that provides the highest resolution so that the auxiliary pattern is not resolved.

REFERENCES:
patent: 5345292 (1994-09-01), Shiozawa et al.
patent: 5357311 (1994-10-01), Shiraishi
patent: 5726740 (1998-03-01), Shiozawa et al.
patent: 6211944 (2001-04-01), Shiraishi
patent: 6355382 (2002-03-01), Yasuzato et al.
patent: 20020177048 (2002-11-01), Saitoh et al.
patent: 4-225514 (1992-08-01), None
patent: 5-21312 (1993-01-01), None
patent: 5-283317 (1993-05-01), None

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