Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate
2005-04-12
2005-04-12
Nguyen, Henry Hung (Department: 2851)
Photocopying
Projection printing and copying cameras
Step and repeat
C355S067000
Reexamination Certificate
active
06879380
ABSTRACT:
When the ordinary exposure is performed, a wafer, to which a photoresist is applied by a resist coater, is transported onto a wafer stage of a projection exposure apparatus to perform the exposure, followed by development by a developing apparatus. When the characteristic is evaluated, respective shot areas on the wafer applied with the photoresist are exposed with an image of a predetermined evaluating mark in a narrow area in an effective field of a projection optical system of the projection exposure apparatus. The characteristic of the resist coater or the developing apparatus is evaluated by detecting a state of a resist pattern after the development. When the image formation characteristic of the projection exposure apparatus is evaluated, the wafer is exposed with images of a plurality of predetermined evaluating marks in a wide area in the effective field. The respective characteristics of the resist coater, the exposure apparatus, and the developing apparatus for constructing a lithography system can be evaluated respectively independently.
REFERENCES:
patent: 5409538 (1995-04-01), Nakayama et al.
patent: 5790254 (1998-08-01), Ausschnitt
patent: 5968691 (1999-10-01), Yoshioka et al.
patent: 6057908 (2000-05-01), Ota
patent: 6423977 (2002-07-01), Hayasaki et al.
patent: 6636311 (2003-10-01), Ina et al.
patent: 0 856 774 (1998-08-01), None
patent: 0 973 069 (2000-01-01), None
patent: 2 314 941 (1998-01-01), None
patent: 2-10884 (1990-01-01), None
patent: A-4-361547 (1992-12-01), None
patent: B2 2530080 (1996-06-01), None
Nguyen Henry Hung
Nikon Corporation
Oliff & Berridg,e PLC
LandOfFree
Method for evaluating lithography system, method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for evaluating lithography system, method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for evaluating lithography system, method for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3385504