Semiconductor device manufacturing: process – Chemical etching
Reexamination Certificate
2005-03-22
2005-03-22
Ullah, Akm Enayet (Department: 2874)
Semiconductor device manufacturing: process
Chemical etching
C385S014000, C385S015000, C359S199200, C359S196100
Reexamination Certificate
active
06869881
ABSTRACT:
A method for forming a hybrid active electronic and optical circuit using a lithography mask. The hybrid active electronic and optical circuit comprising an active electronic device and at least one optical device on a Silicon-On-Insulator (SOI) wafer. The SOI wafer including an insulator layer and an upper silicon layer. The upper silicon layer including at least one component of the active electronic device and at least one component of the optical device. The method comprising projecting the lithography mask onto the SOI waver in order to simultaneously pattern the component of the active electronic device and the component of the optical device on the SOI wafer.
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SiOptical Inc.
Ullah Akm Enayet
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