Lithographic apparatus, device manufacturing method, and...

Details Lithographic apparatus, device manufacturing method, and... Lithographic apparatus, device manufacturing method, and...

2005-05-03

2005-05-03

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C355S072000, C355S075000, C355S066000, C438S016000, C438S030000

Reexamination Certificate

active

06888151

ABSTRACT:
A lithographic apparatus according to one embodiment of the invention includes an image sensing device configured and arranged to measure a pattern in a patterned beam of radiation. The image sensing device comprises a slab on which at least two sensors are formed. The sensors are sensitive to radiation of the beam and are arranged on a first side of the slab. A film that is non-transparent to radiation of the beam is provided at the first side over the sensors. The film includes a patterned segment above each sensor.

REFERENCES:
patent: 4585342 (1986-04-01), Lin et al.
patent: 5153916 (1992-10-01), Inagaki et al.
patent: 5265143 (1993-11-01), Early et al.
patent: 5767523 (1998-06-01), McCullough
patent: 6583859 (2003-06-01), Miyajima et al.
patent: 1 063 570 (2000-12-01), None

Affiliated with

Also associated with

Rating

Lithographic apparatus, device manufacturing method, and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus, device manufacturing method, and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus, device manufacturing method, and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3381884