Dual-port end point window for plasma etcher

Details Dual-port end point window for plasma etcher Dual-port end point window for plasma etcher

2005-03-08

2005-03-08

Zervigon, Rudy (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

For liquid etchant

C156S345150, C156S345240, C156S345250, C118S715000, C118S663000, C118S712000, C118S713000

Reexamination Certificate

active

06863772

ABSTRACT:
A dual-port endpoint detection window for a process chamber for substrates. The dual-port endpoint detection window of the present invention comprises a primary port and a secondary port each of which may be individually removably fitted with a light sensor for the endpoint detection system. A cover is provided for removably covering the secondary port. After the window of the primary port has become covered with material deposition as a result of prolonged use of the process chamber, the secondary port is uncovered for use and the light sensor is attached to the secondary port for continued use of the endpoint detection system through the secondary port.

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