Method in an integrated circuit (IC) manufacturing process...

Data processing: measuring – calibrating – or testing – Testing system – Of circuit

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C702S118000, C702S082000, C700S116000, C700S224000, C700S226000

Reexamination Certificate

active

06944567

ABSTRACT:
A method of manufacturing IC devices from semiconductor wafers includes providing the wafers and fabricating ICs on the wafers. At probe, a unique fuse ID is stored in each IC, and an electronic wafer map is electronically stored for each wafer indicating the locations of good and bad ICs on the wafer and the fuse IDs of the ICs on the wafer. Each IC is then separated from its wafer to form an IC die, and the IC dice are assembled into IC devices. At the opens/shorts test at the end of assembly, the fuse ID of each IC in each device is automatically retrieved so the wafer map of the IC device may be accessed and evaluated to identify any IC devices containing bad ICs that have accidentally been assembled into IC devices. Any “bad” IC devices are discarded while remaining IC devices continue on to back-end testing.

REFERENCES:
patent: 4032949 (1977-06-01), Bierig
patent: 4455495 (1984-06-01), Masuhara et al.
patent: 4510673 (1985-04-01), Shils et al.
patent: 4534014 (1985-08-01), Ames
patent: 4667403 (1987-05-01), Edinger et al.
patent: 4871963 (1989-10-01), Cozzi
patent: 4954453 (1990-09-01), Venutolo
patent: 4958373 (1990-09-01), Usami et al.
patent: 4967381 (1990-10-01), Lane et al.
patent: 5003251 (1991-03-01), Fuoco
patent: 5103166 (1992-04-01), Jeon et al.
patent: 5105362 (1992-04-01), Kotani
patent: 5110754 (1992-05-01), Lowrey et al.
patent: 5217834 (1993-06-01), Higaki
patent: 5219765 (1993-06-01), Yoshida et al.
patent: 5226118 (1993-07-01), Baker et al.
patent: 5235550 (1993-08-01), Zagar
patent: 5253208 (1993-10-01), Kang
patent: 5256562 (1993-10-01), Vu et al.
patent: 5256578 (1993-10-01), Corley et al.
patent: 5271796 (1993-12-01), Miyashita et al.
patent: 5289113 (1994-02-01), Meaney et al.
patent: 5294812 (1994-03-01), Hashimoto et al.
patent: 5296402 (1994-03-01), Ryou
patent: 5301143 (1994-04-01), Ohri et al.
patent: 5326709 (1994-07-01), Moon et al.
patent: 5345110 (1994-09-01), Renfro et al.
patent: 5352945 (1994-10-01), Casper et al.
patent: 5355320 (1994-10-01), Erjavic et al.
patent: 5420796 (1995-05-01), Weling et al.
patent: 5424652 (1995-06-01), Hembree et al.
patent: 5428311 (1995-06-01), McClure
patent: 5440240 (1995-08-01), Wood et al.
patent: 5440493 (1995-08-01), Doida
patent: 5442561 (1995-08-01), Yoshizawa et al.
patent: 5450326 (1995-09-01), Black
patent: 5467304 (1995-11-01), Uchida et al.
patent: 5477493 (1995-12-01), Danbayashi
patent: 5483175 (1996-01-01), Ahmad et al.
patent: 5495417 (1996-02-01), Fuduka et al.
patent: 5504369 (1996-04-01), Dasse et al.
patent: 5511005 (1996-04-01), Abbe et al.
patent: 5516028 (1996-05-01), Rasp et al.
patent: 5537325 (1996-07-01), Iwakiri et al.
patent: 5538141 (1996-07-01), Gross, Jr. et al.
patent: 5539235 (1996-07-01), Allee
patent: 5563832 (1996-10-01), Kagami
patent: 5568408 (1996-10-01), Maeda
patent: 5570293 (1996-10-01), Tanaka et al.
patent: 5581510 (1996-12-01), Furusho et al.
patent: 5590069 (1996-12-01), Levin
patent: 5600171 (1997-02-01), Makihara et al.
patent: 5603412 (1997-02-01), Gross, Jr. et al.
patent: 5606193 (1997-02-01), Ueda et al.
patent: 5617366 (1997-04-01), Yoo
patent: 5619469 (1997-04-01), Joo
patent: 5625816 (1997-04-01), Burdick et al.
patent: 5642307 (1997-06-01), Jernigan
patent: 5726074 (1998-03-01), Yabe
patent: 5764650 (1998-06-01), Debenham
patent: 5787190 (1998-07-01), Peng et al.
patent: 5801965 (1998-09-01), Takagi et al.
patent: 5828778 (1998-10-01), Hagi et al.
patent: 5844803 (1998-12-01), Beffa
patent: 5856923 (1999-01-01), Jones et al.
patent: 5865319 (1999-02-01), Okuda et al.
patent: 5867505 (1999-02-01), Beffa
patent: 5889674 (1999-03-01), Burdick et al.
patent: 5895962 (1999-04-01), Zheng et al.
patent: 5907492 (1999-05-01), Akram et al.
patent: 5915231 (1999-06-01), Beffa
patent: 5927512 (1999-07-01), Beffa
patent: 5963881 (1999-10-01), Kahn et al.
patent: 5991699 (1999-11-01), Kulkarni et al.
patent: 6000830 (1999-12-01), Asano et al.
patent: 6018686 (2000-01-01), Orso et al.
patent: 6049624 (2000-04-01), Wilson et al.
patent: 6055463 (2000-04-01), Cheong et al.
patent: 6067507 (2000-05-01), Beffa
patent: 6072574 (2000-06-01), Zeimantz
patent: 6075216 (2000-06-01), Nakamura et al.
patent: 6100486 (2000-08-01), Beffa
patent: 6122563 (2000-09-01), Beffa
patent: 6130442 (2000-10-01), Di Zenzo et al.
patent: 6138256 (2000-10-01), Debenham
patent: 6147316 (2000-11-01), Beffa
patent: 6148307 (2000-11-01), Burdick et al.
patent: 6190972 (2001-02-01), Zheng et al.
patent: 6194738 (2001-02-01), Debenham et al.
patent: 6208947 (2001-03-01), Beffa
patent: 6219810 (2001-04-01), Debenham
patent: 6226394 (2001-05-01), Wilson et al.
patent: 6259520 (2001-07-01), Zeimantz
patent: 6307171 (2001-10-01), Beffa
patent: 6350959 (2002-02-01), Beffa
patent: 6363295 (2002-03-01), Akram et al.
patent: 6363329 (2002-03-01), Beffa
patent: 6365421 (2002-04-01), Debenham et al.
patent: 6365860 (2002-04-01), Beffa
patent: 6365861 (2002-04-01), Beffa
patent: 6373011 (2002-04-01), Beffa
patent: 6373566 (2002-04-01), Zeimantz
patent: 6400840 (2002-06-01), Wilson et al.
patent: 6427092 (2002-07-01), Jones et al.
patent: 6437271 (2002-08-01), Beffa
patent: 6441897 (2002-08-01), Zeimantz
patent: 6504123 (2003-01-01), Beffa
patent: 6529793 (2003-03-01), Beffa
patent: 6553276 (2003-04-01), Akram et al.
patent: 6588854 (2003-07-01), Wilson et al.
patent: 6594611 (2003-07-01), Beffa
patent: 6636068 (2003-10-01), Farnworth et al.
patent: 6703573 (2004-03-01), Beffa
patent: 6788993 (2004-09-01), Beffa
patent: 58050728 (1983-03-01), None
patent: 58060529 (1983-04-01), None
patent: 61120433 (1986-06-01), None
patent: 05013529 (1993-01-01), None
patent: 05-074909 (1993-03-01), None
patent: 10104315 (1998-04-01), None
patent: 1151333 (1985-04-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method in an integrated circuit (IC) manufacturing process... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method in an integrated circuit (IC) manufacturing process..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method in an integrated circuit (IC) manufacturing process... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3376773

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.