Semiconductor wafer tilt compensation by wafer rotation and...

Details Semiconductor wafer tilt compensation by wafer rotation and... Semiconductor wafer tilt compensation by wafer rotation and...

2005-04-26

2005-04-26

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C430S030000, C250S548000, C355S039000, C355S077000

Reexamination Certificate

active

06884554

ABSTRACT:
Compensating for semiconductor wafer tilt by rotating the semiconductor wafer and averaging the resulting semiconductor wafer tilts detected is disclosed. The semiconductor wafer has an asymmetrical topography. A first leveling tilt of the semiconductor wafer is detected using a leveling sensor of a stepper. The semiconductor wafer is then effectively or actually rotated, such as by forty-five degrees, ninety-degrees, or one-hundred-eighty degrees. A second leveling tilt of the semiconductor wafer is then detected, again using the leveling sensor of the stepper. The first and the second leveling tilts are averaged to yield an average leveling tilt. The average leveling tilt is then compensated for, by, for instance, oppositely tilting the semiconductor wafer in an effective or actual manner.

REFERENCES:
patent: 6704094 (2004-03-01), Chen
patent: 6818365 (2004-11-01), Barber

Affiliated with

Also associated with

Rating

Semiconductor wafer tilt compensation by wafer rotation and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor wafer tilt compensation by wafer rotation and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor wafer tilt compensation by wafer rotation and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3374418