Method for the fabrication of three-dimensional...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C430S014000, C430S322000, C378S035000

Reexamination Certificate

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06875544

ABSTRACT:
A method for the fabrication of three-dimensional microstructures by deep X-ray lithography (DXRL) comprises a masking process that uses a patterned mask with inclined mask holes and off-normal exposures with a DXRL beam aligned with the inclined mask holes. Microstructural features that are oriented in different directions can be obtained by using multiple off-normal exposures through additional mask holes having different orientations. Various methods can be used to block the non-aligned mask holes from the beam when using multiple exposures. A method for fabricating a precision 3D X-ray mask comprises forming an intermediate mask and a master mask on a common support membrane.

REFERENCES:
patent: 5045439 (1991-09-01), Maner et al.
patent: 5576147 (1996-11-01), Guckel et al.
patent: 5679502 (1997-10-01), Siddons et al.
patent: 5866281 (1999-02-01), Guckel et al.
patent: 6080514 (2000-06-01), Choi
patent: 6252725 (2001-06-01), Tran et al.
Sweatt, et al., “Microoptical System and Fabrication Method Therfor”, U.S. Appl. No. 09/742,778, filed Dec. 20, 2000.
Yablonovitch, et al., “Photonic Band Structure: The Face-Centered-Cubic Case Employing Nonspherical Atoms”Phys. Rev. Lett. 67(17), 2295 (1991).
Feiertag, et al., “Fabrication of photonic crystals by deep x-ray lithography,”Appl. Phys. Lett. 71,1441 (1997).
Ehrfeld, et al., “Recent developments in deep x-ray lithography,”J. Vac. Sci. Technol. B 16(6), 3526 (1998).
Ehrfeld, et al., “Materials of LIGA technology,”Microsystems Technologies 5,105 (1999).
Cuisin, et at., “Fabrication of three-dimensional microstructures by high resolution x-ray lithography,”J. Vac. Sci. Technol. B 17(6), 3444 (1999).
Luttge, et al., “40 keV Shaped Electron Beam Lithography for LIGA Intermediate Mask Fabricaton,”Microelectronic Engineering 46,247 (1999).
Cuisin, et al., “Fabrication of three-dimensional photonic structures with submicrometer resolution by x-ray lithography,”J. Vac. Sci. Technol B 18(6), 3505 (2000).
Cuisin, et al., “Submicrometer resolution Yablonovite templates fabricated by x-ray lithography,”Appl. Phys. Lett. 77(6), 770 (2000).
Oh, et al., “A tetrahedral three-facet micro mirror with the inclined deep X-ray process,”Sensors and Actuators A 93,157 (2001).
Schmidt, et al., “High precision mask fabrication for deep X-ray lithography using 40-kV shaped electron beam lithography,”Microelectronic Engineering 57,761 (2001).
Cuisin, et al., “Sub-micrometre dielectric and metallic yablonovite structures fabricated from resist templates,”Optical and Quantum Electronics 13(2002).

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