Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2005-03-08
2005-03-08
Boudreau, Leo (Department: 2623)
Image analysis
Applications
Manufacturing or product inspection
C382S141000, C382S144000
Reexamination Certificate
active
06865288
ABSTRACT:
A pattern inspection method and apparatus are disclosed, the method has the steps of generating a reference digital image signal to be compared with a detection digital image signal detected continuously from the desired band-shaped inspection area on an object to be inspected, determining zero or one or more candidate , matching positions between the detection digital image signal and the reference digital image signal for each block unit area sequentially cut out and calculating a mass of candidate matching positions over the entire band-shaped inspection area, determining an accurate matching position between the detection digital image signal and the reference digital image signal for each block unit area based on the continuity of the block unit areas from the calculated mass of candidate matching positions over the entire band-shaped inspection area, and determining a defect by matching the positions based on the determined accurate matching position for each block unit area and comparing the images.
REFERENCES:
patent: 5157735 (1992-10-01), Maeda et al.
patent: 5649022 (1997-07-01), Maeda et al.
patent: 5774222 (1998-06-01), Maeda et al.
patent: A-5-6928 (1993-01-01), None
patent: A-10-74812 (1998-03-01), None
Miyai Hiroshi
Shishido Chie
Takagi Yuji
Watanabe Masahiro
Antonelli Terry Stout & Kraus LLP
Boudreau Leo
Dang Duy M.
Hitachi , Ltd.
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