Optics: measuring and testing – By dispersed light spectroscopy – With sample excitation
Reexamination Certificate
2002-12-17
2004-06-29
Le, Thien M. (Department: 2876)
Optics: measuring and testing
By dispersed light spectroscopy
With sample excitation
C356S219000
Reexamination Certificate
active
06757061
ABSTRACT:
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates real-time gas sampling and spectral analysis.
2. Description of Related Art
Semiconductor manufacturing has adopted various telemetry techniques utilizing mass spectrometry or spectrographical analysis to improve the cleaning, conditioning or operation of reaction chambers in which a variety of reactions take place, such as deposition, cleaning, etching, implantation, ashing, etc. Telemetry techniques help operators monitor processes which take place on a microscopic level inside a closed chamber which often is sensitive to any form of outside radiation.
SUMMARY OF INVENTION
One aspect of the present invention includes sampling gas outside a reaction chamber that has passed through the reaction chamber during a process, wherein the gas diffuses into an excitation chamber. In the excitation chamber, exciting the sampled gas, using at least one external electrode, to emit radiation. And, detecting in real time from the emitted radiation a plurality of wave bands of an emission spectrum. Energy used to excite the sampled gas may be adjusted based on the detected wave bands. A process may be controlled in real time based on the detected wave bands. Novel interfaces may be used to display portions of the detected wave bands. A known flow of a reference gas may be included in the flow of sampled gases and an unknown flow of an unknown flow gas determined. Other aspects of the present invention are set forth in the claims.
REFERENCES:
patent: 3734631 (1973-05-01), Justice et al.
patent: 4147431 (1979-04-01), Mann
patent: 4148612 (1979-04-01), Taylor et al.
patent: 4270091 (1981-05-01), Mann
patent: 4309187 (1982-01-01), Dodge et al.
patent: 4609426 (1986-09-01), Ogawa et al.
patent: 4615761 (1986-10-01), Tada et al.
patent: 4844767 (1989-07-01), Okudaira et al.
patent: 4847792 (1989-07-01), Barna et al.
patent: 4857136 (1989-08-01), Zajac
patent: 4859277 (1989-08-01), Barna et al.
patent: 4883560 (1989-11-01), Ishihara
patent: 5082517 (1992-01-01), Moslehi
patent: 5160402 (1992-11-01), Cheng
patent: 5273610 (1993-12-01), Thomas, III et al.
patent: 5326975 (1994-07-01), Barna
patent: 5372783 (1994-12-01), Lackie
patent: 5431734 (1995-07-01), Chapple-Sokol et al.
patent: 5473162 (1995-12-01), Busch et al.
patent: 5546322 (1996-08-01), Gifford et al.
patent: 5671045 (1997-09-01), Woskov et al.
patent: 5777735 (1998-07-01), Reagen
patent: 5841651 (1998-11-01), Fu
patent: 5857890 (1999-01-01), Ferran
patent: 5877032 (1999-03-01), Guinn et al.
patent: 5949193 (1999-09-01), Roine et al.
patent: 5963336 (1999-10-01), McAndrew et al.
patent: 5986747 (1999-11-01), Moran
patent: 6045618 (2000-04-01), Raoux et al.
patent: 6046796 (2000-04-01), Markle et al.
patent: 6068783 (2000-05-01), Szetsen
patent: 6075609 (2000-06-01), Tarkanic et al.
patent: 6120734 (2000-09-01), Lackie
patent: 6134005 (2000-10-01), Smith, Jr. et al.
patent: 6366346 (2002-04-01), Nowak et al.
patent: 6381022 (2002-04-01), Zavracky
patent: 2002/0093652 (2002-07-01), Powell
patent: 58084431 (1983-05-01), None
Danner et al., “Downstream Atomic Monitoring for Absolute Etch Rae Determinations”, J. Electrochem. Soc: Solid-State Science and Technology (Apr. 1983).
Lichtman, “Residual Gas Analysis: Past, Present and Future”, J. Vac. Sci. Technol. A8(3) May/Jun. 1990, 1990 American Vacuum Society.
Beffel, Jr. Ernest J.
Haynes Beffel & Wolfeld LLP
Le Thien M.
Lightwind Corporation
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