Positive resist composition comprising a cyclic dimer of isoprop

Details Positive resist composition comprising a cyclic dimer of isoprop Positive resist composition comprising a cyclic dimer of isoprop

1991-05-06

1992-07-14

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, G03F 7022, G03F 7023

Patent

active

051302250

ABSTRACT:
A positive resist composition comprising an alkali-soluble resin, a quinone diazide compound and a specific hydroxyl group-containing compound can improve sensitivity without deterioration of heat resistance and film thickness retention.

REFERENCES:
patent: 3288864 (1966-11-01), Farnham
patent: 4245128 (1981-01-01), Kato et al.
patent: 4366328 (1982-12-01), Numata et al.
patent: 4626492 (1986-12-01), Eilbeck
patent: 4696886 (1987-09-01), Hanabata et al.

Affiliated with

Also associated with

Rating

Positive resist composition comprising a cyclic dimer of isoprop does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive resist composition comprising a cyclic dimer of isoprop, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive resist composition comprising a cyclic dimer of isoprop will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-334047