Photolithographic mask fabrication

Details Photolithographic mask fabrication Photolithographic mask fabrication

2002-04-04

2004-12-14

Mohamedulla, Saleha R. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06830851

ABSTRACT:

TECHNICAL FIELD
This invention relates to fabrication of photolithographic masks for semiconductor processing.
BACKGROUND
Photolithography uses an imaging system that directs radiation onto a patterned mask to form an image that then is projected onto a semiconductor wafer covered with light-sensitive photoresist.


REFERENCES:
patent: 5328784 (1994-07-01), Fukuda
patent: 5503950 (1996-04-01), Miyake et al.
Masaaki Ito et al., Optical Technology for EUV Lithography pp. 9-12, 1996, Central Research Laboratory, Hitachi, Ltd., Tokyo 185, Japan.

Affiliated with

Also associated with

Rating

Photolithographic mask fabrication does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photolithographic mask fabrication, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photolithographic mask fabrication will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3307689