Method of making charge-coupled arrangement in the two-phase tec

Details Method of making charge-coupled arrangement in the two-phase tec Method of making charge-coupled arrangement in the two-phase tec

1979-07-25

1981-09-22

Roy, Upendra

Metal working

Method of mechanical manufacture

Assembling or joining

29578, 29591, 148 15, 357 24, H01L 1300, H01L 2710

Patent

active

042901871

ABSTRACT:
A charge-coupled arrangement in the two-phase technique in accordance with the charge-coupled-device principle in which an electrically insulating layer is applied to a substrate of semi-conductor material, with such electrodes arranged in spaced relation on such layer, a second electrically insulating layer disposed on the electrodes and additional electrodes being disposed on the second insulating layer, in which such additional electrodes extend into spaces separating adjacent electrodes applied to the substrate, with the zone of the substrate beneath such further electrodes being more highly doped than the substrate. The electrodes may comprise aluminum silicon, molybdenum, chromium or tungsten, while the second insulating layer may comprise SiO.sub.2 or Al.sub.2 O.sub.3.

REFERENCES:
patent: 3852799 (1974-12-01), Walden

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