Processing method using fast atom beam

Details Processing method using fast atom beam Processing method using fast atom beam

1996-07-09

1998-01-13

Anderson, Bruce

Radiant energy

Electrically neutral molecular or atomic beam devices and...

2504921, H05H 300

Patent

active

057082677

ABSTRACT:
A processing method using a fast atom beam wherein a surface of a substrate to be processed is covered with a masking member formed with patterned holes and the masking member is irradiated with the fast atom beam from a fast atom beam generator so that substrate is processed by the fast atom beam applied to the surface of the substrate through the patterned holes of the masking member.

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J. Appl. Phys, Sep. 1989, Shimokawa et al., 66:2613-2618, Active-fast-atom beam etching of GaAs using C1.sub.2 gas Practice of Integrated Circuit Techniques, Nakamura et al., pp. 22-23.

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