Method of detecting positional displacement between mask and waf

Details Method of detecting positional displacement between mask and waf Method of detecting positional displacement between mask and waf

1994-09-01

1996-04-16

Berman, Jack I.

Radiant energy

Means to align or position an object relative to a source or...

G01J 100

Patent

active

055085270

ABSTRACT:
A method and apparatus for detecting the relative positional displacement between a mask and a wafer. The mask is provided with a cantilever. The position mark is provided on the wafer so as to face the cantilever. A relative positional displacement between the mask and the wafer is detected from a deformation amount of the cantilever based on a force acting between the position mark and the cantilever upon relative movement of the position mark and the cantilever.

REFERENCES:
patent: 4912408 (1990-03-01), Sawada et al.
patent: 5130554 (1992-07-01), Nose et al.
patent: 5150392 (1992-09-01), Hohn et al.
patent: 5157251 (1992-10-01), Albrecht et al.
patent: 5168159 (1992-12-01), Yagi
patent: 5245863 (1993-09-01), Kajimura et al.
Physical Review Letters, vol. 56, No. 9, "Atomic Force Microscope" by Binnig, et al., pp. 930 to 933, Mar. 3, 1986.
Applied Physics Letters, vol. 31, No. 7, "A New Interferometric Alignment Technique", by Flanders, et al., pp. 426-428, Oct. 1, 1977.

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