Photosensitive material, and image formation process and image f

Radiation imagery chemistry: process – composition – or product th – Transfer procedure between image and image layer – image... – Image layer portion transfer and element therefor

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430254, 430270, 430330, 430271, 250318, G03C 1112

Patent

active

050046675

ABSTRACT:
A photosensitive material and comprises a photosensitive and heat-developable element and a polymer, and is capable of being endowed with stickness by a change of pH value or being subjected to exposure and heating. An image formation process comprises the steps of subjecting to imagewise exposure the photosensitive material, heating the photosensitive material, electrifying the photosensitive material, and transferring the iamgewise exposed or unexposed portion of the photosensitive material. The photosensitive and heat-developable element comprises a least a photosensitive silver salt and a reducing agent and the polymer has a cross-linked structure.

REFERENCES:
patent: 3353955 (1967-11-01), Colgrove
patent: 3487764 (1970-01-01), Borden et al.
patent: 3909257 (1975-09-01), Davidson
patent: 3912504 (1975-10-01), Kropac
patent: 4108655 (1978-08-01), Kropac
patent: 4210711 (1980-07-01), Kitajima et al.
patent: 4272608 (1981-06-01), Proskow
patent: 4334006 (1982-06-01), Kitaima et al.
patent: 4396700 (1983-08-01), Kitaima et al.
patent: 4558003 (1985-12-01), Sagawa
patent: 4620096 (1986-10-01), Takehara et al.
patent: 4629676 (1986-12-01), Hayakawa et al.
patent: 4737822 (1988-04-01), Taniguchi et al.
patent: 4764451 (1988-08-01), Ishikawa
patent: 4800275 (1989-01-01), Shimizu et al.
patent: 4822717 (1989-04-01), Nakamura
patent: 4825074 (1989-04-01), Yoshikawa

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photosensitive material, and image formation process and image f does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive material, and image formation process and image f, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive material, and image formation process and image f will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-326372

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.