Method for the making of a transistor gate

Fishing – trapping – and vermin destroying

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437 40, 437 80, 437175, 437229, 437912, 437944, 148DIG100, H01L 2170

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051852772

ABSTRACT:
Disclosed is a method for making a mushroom gate for a microwave transistor. Three masking layers are deposited on the semiconductor body of a transistor. At least two of these masking layers are different and have selective solvents. After the opening of the external layer, the intermediate layer is dissolved with sub-etching with respect to the external layer, then the base of the gate is etched in the internal layer. The edges of the sub-etching prevent the metal deposited on the mask from adhering to the gate, thus facilitating the lift-off of the mask. Application to microwave transistors with symmetrical or disymmetrical mushroom gate.

REFERENCES:
patent: 4283483 (1981-08-01), Coane
patent: 4334349 (1982-06-01), Aoyama et al.
patent: 4337115 (1982-06-01), Ikeda et al.
patent: 5006478 (1991-04-01), Kobayashi et al.
IEEE Transactions on Electronic Devices, vol. ED-32, No. 6, Jun. 1985, pp. 1042-1046, IEEE, U.S., P. C. Chao et al.: "Electron-Beam Fabrication of GaAs Low-Noise MESFET's Using a New Trilayer Resist Technique".
IEEE Electron Device Letters, vol. EDL-4, No. 2, Feb. 1983, pp. 42-44, IEEE, U.S., S. G. Bandy et al.: "Submicron GaAs Microwave FET's with Low Parasitic Gate and Source Resistances".

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