Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1994-11-15
1996-04-16
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430311, 430312, 430313, G03F 900
Patent
active
055081339
ABSTRACT:
A photo mask used to form a positive photoresist film pattern at a region defined adjacent to a depression formed on a layer to be patterned, including a chromium pattern formed on a quartz substrate and a plurality of dot patterns formed on the quartz substrate and disposed adjacent to a portion of the chromium pattern overlapping with the depression of the layer to be patterned, the dot patterns being adapted to reduce an intensity of a light incident on a portion of the quartz substrate overlapping with the depression of the layer to be patterned, thereby capable of preventing an occurrence of a notching phenomenon, at a photoresist film pattern, caused by an irregular light reflection generated by a slant surface of the depression. The photo mask makes it possible to prevent the photoresist film pattern form being damaged due to a light exposure of an unintended portion of the photoresist film to a light reflected by the slant surface.
REFERENCES:
patent: 5411824 (1995-05-01), Vasudev et al.
patent: 5422206 (1995-06-01), Kamon
Hyundai Electronics Industries Co,. Ltd.
Rosasco S.
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