Electron beam exposure apparatus

Details Electron beam exposure apparatus Electron beam exposure apparatus

1998-01-29

1999-08-17

Nguyen, Kiet T.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504911, G06F 1546

Patent

active

059397250

ABSTRACT:
This invention relates to an electron beam exposure apparatus which draws a pattern by accelerating an electron beam emitted by an electron source using an acceleration electrode, and irradiating the electron beam onto a wafer placed on a stage. Deviations DDX and DDY between the irradiated position of the electron beam with respect to the stage at a first acceleration voltage, and that at a second acceleration voltage higher than the first acceleration voltage are detected. The positional relationship between the wafer and the irradiated position of the electron beam with respect to the wafer at the second acceleration voltage is detected. Based on the deviations DDX and DDY and the positional relationship, the positional relationship between the wafer and the irradiated position of the electron beam with respect to the wafer at the first acceleration voltage is calculated.

REFERENCES:
patent: 4947047 (1990-08-01), Muraki
patent: 4974919 (1990-12-01), Muraki et al.
patent: 5153773 (1992-10-01), Muraki et al.
patent: 5345292 (1994-09-01), Shiozawa et al.
patent: 5363170 (1994-11-01), Muraki
patent: 5448357 (1995-09-01), Muraki
patent: 5463497 (1995-10-01), Muraki et al.
patent: 5499076 (1996-03-01), Muraki
patent: 5715084 (1998-02-01), Takahashi et al.
patent: 5831273 (1998-11-01), Someda

Affiliated with

Also associated with

Rating

Electron beam exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-316973