Polishing slurry of xanthan gum and a dispersing agent

Abrasive tool making process – material – or composition – With carbohydrate or reaction product thereof

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51284R, 51298, 106 5, C09K 314

Patent

active

041613945

ABSTRACT:
A solution for use in suspending 0.05 to 15 micron ceria or alumina particles to produce a slurry for polishing lenses and semiconductor wafers is disclosed. The solution consists of water containing from 0.06 to 0.75 percent by weight of xanthan gum and from 0.5 to 5.0 percent by weight of a dispersing agent selected from the group consisting of the condensate of formaldehyde with naphthalene monosulfonic acid, polymethacrylic acid and their ammonium and alkali metal salts. The slurry is prepared by mixing one volume of the solution with about two volumes of water and then dispersing alumina, ceria, or zirconia particles in the resultant mixture. The quantity of ceria or alumina dispersed is in the range 10 to 20 percent by weight based on the combined weight of solution and added water.

REFERENCES:
patent: 3413252 (1968-11-01), Lima
patent: 3462251 (1969-08-01), Whalen et al.

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