Chemistry: electrical and wave energy – Apparatus – Electrolytic
Reexamination Certificate
2001-02-06
2003-06-24
Nguyen, Nam (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Electrolytic
C204S199000, C204S222000, C204S242000, C204S286100, C204S297010, C204S297060, C204S297070, C204S297080
Reexamination Certificate
active
06582570
ABSTRACT:
FIELD OF THE INVENTION
The present invention relates to an electroplating apparatus for wheel disk, especially to an electroplating apparatus for wheel disk of various sizes and thickness, and having dual anodes.
BACKGROUND OF THE INVENTION
The electroplating is used to plate metal on surface of article to provide pleasant and radiant appearance to the article. Moreover, the electroplating can also provide anti-corrosion and high hardness.
As shown in
FIGS. 1 and 2
, the conventional electroplating apparatus comprises an electrolytic cell
1
a
for containing electro bath (not shown). The electrolytic cell
1
a
has a cathode plate
2
a
on topside thereof and the cathode plate
2
a
has been provided with a mounting rack
20
a
extended downward therefrom and dipped into the electro bath. The mounting rack
20
a
is used to hold the wheel disk
4
a
to be plated. The mounting rack
20
a
has different specifications to hold wheel disks
4
a
of different size, thickness and outer radius. An electrode
21
a
is arranged below the wheel disk
4
a
and in contact with the wheel disk
4
a
. The electrode
21
a
is functioned as cathode of the electrolytic cell
1
a
. Moreover, a plurality of anode plates
3
a
are provided on both sides of the wheel disk
4
a
. The cations dissolved from the anode plates
3
a
are moved toward the cathode through the electro bath and then attached on the wheel disk
4
a
. After a certain processing time, sufficient cations are attached on the wheel disk
4
a
to provide the wheel disk
4
a
with smooth and radiant appearance.
However, the wheel disks
4
a
generally have different size, thickness and outer radius, and several problems exist.
First, the wheel disks
4
a
have different size, thickness and outer radius such that different mounting rack
20
a
is required. Therefore, the mounting rack
20
a
is frequently changed to increase processing time.
Secondly, in the plating process, the electrode
21
a
continuously shocks the surface of the wheel disk
4
a
, the electrode
21
a
may be stuck on the surface of the wheel disk
4
a
. The electrode
21
a
is hard to separate from the surface of the wheel disk
4
a
, thus influencing the appearance of the wheel disk
4
a.
Thirdly, the wheel disk
4
a
generally has complicated shape, for example, the wheel disk
4
a
may have many grooves and holes thereon. The grooves and holes may be blocked by bubble generated when the wheel disk
4
a
is dipped into the electro bath. Therefore, the locations with grooves and holes are hard to be plated.
SUMMARY OF THE INVENTION
It is the object of the present invention to provide an electroplating apparatus for wheel disk of various sizes and thickness, and having dual anodes.
In one aspect of the invention, the electroplating apparatus for wheel disk comprises an electrolytic cell containing electrolytic bath, a cathode plate, an auxiliary anode, at least one anode plate and a driving mechanism. The electroplating apparatus for wheel disk does not require the arrangement of the mounting rack and can be adapted to wheel disk of various size and thickness. The wheel disk is rotated by the driving mechanism to prevent tip-discharging. The bubble in the grooves and holes of the wheel disk floats to surface of the bath, the wheel disk can be thoroughly plated.
In one aspect of the invention, the electroplating apparatus for wheel disk comprises dual anodes. The anode plate is used to plate most area of the wheel disk and the auxiliary anode is used to plate the grooves and holes of the wheel disk, the wheel disk can be thoroughly plated.
The various objects and advantages of the present invention will be more readily understood from the following detailed description when read in conjunction with the appended drawing, in which:
REFERENCES:
patent: 3964987 (1976-06-01), Reppert et al.
patent: 4014765 (1977-03-01), Roth et al.
patent: 6103076 (2000-08-01), Mizuno
patent: 6406542 (2002-06-01), Stepancik
patent: 01147092 (1989-06-01), None
Mutschler Brian L.
Nguyen Nam
Rosenberg , Klein & Lee
LandOfFree
Electroplating apparatus for wheel disk does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Electroplating apparatus for wheel disk, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electroplating apparatus for wheel disk will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3158451