Monolithic bypass-diode and solar-cell string assembly

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation

Reexamination Certificate

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C438S059000, C438S064000, C438S066000, C136S243000, C136S244000, C136S258000

Reexamination Certificate

active

06635507

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to devices and methods for making semiconductor devices, and in particular to a device and method for making monolithic bypass-diodes and solar-cell string assemblies.
2. Description of the Related Art
Solar cells are used in various technologies to provide power to other electronic assemblies. Satellites, calculators, and power systems are all examples of solar cell usage.
A solar cell is a p-n junction created over a large area on a semiconductor substrate. Solar cells are typically long-life devices, but can have their efficiency reduced or destroyed by reverse biasing of the solar cell junction. To prevent this type of damage, bypass diodes (BDs) are used to allow current to flow in an anti-parallel direction to the current flow through the solar cell junction.
Bypass diodes are typically formed using an isolated island structure and/or created in a recess of the back (reverse) of the solar cell substrate, and connected to the solar cell using additional wiring and/or additional metallization on the solar cell substrate. The use of additional wiring and/or additional metallization creates new failure points for solar cells, as well as adding to the weight and complexity of the solar cell structure. Additional weight and failure mechanisms are unacceptable in a spacecraft environment, because of the extreme additional costs involved. Further, additional metallization obscures the solar cell from receiving incident light, which reduces the efficiency of the solar cell structure.
FIGS. 1A-1B
illustrate a related art device that integrates bypass diodes with solar cells.
FIG. 1A
illustrates a cross-sectional view of a semiconductor device. Assembly
100
comprises solar cell
102
and bypass diode
104
. Solar cell
102
utilizes an n-doped substrate
106
and a coupled p-doped layer
108
. Substrate
106
and layer
108
are coupled electrically, such that a depletion layer is created between substrate
106
and layer
108
. The method of coupling can be, for example, deposition of layer
108
on substrate
106
, diffusion of p-type carriers into substrate
106
to form layer
108
, chemical vapor deposition of layer
108
, epitaxial growth of layer
108
on substrate
106
, or other methods.
Bypass diode
104
utilizes a p-doped layer
110
and an n-doped layer
112
to create a separate p-n junction. Layer
110
is electrically coupled to substrate
106
, and is isolated from layer
108
by a dielectric isolation layer
114
. External connections
116
and
118
are complemented by metallization connections
120
and
122
to create the solar cell/bypass diode assembly
100
. A more extensive description of the device illustrated in
FIG. 1A
can be found in U.S. Pat. No. 4,759,803, issued Jul. 26, 1988, which is herein incorporated by reference.
FIG. 1B
illustrates a schematic diagram for assembly
100
. Bypass diode
104
and solar cell
102
are connected in an anti-parallel configuration, with external connections
116
and
118
shown, in order to connect the assembly
100
to other assemblies
100
.
The limitations of the assembly
100
shown in
FIG. 1A
is that there is a third p-n junction in the assembly, namely, that created by the coupling of layer
110
and substrate
106
. Further, the active area of the solar cell
102
, shown as area
124
, is reduced by the physical size of isolation layer
114
and the presence of bypass diode
104
. Since the active area
124
of the solar cell is smaller than without bypass diode
104
, a larger number of solar cells
102
will be required to produce a given amount of power. The assembly also uses a large metallization area, namely
120
and
122
, which makes processing the assembly
100
more difficult, and reduces the yield because of the failures of the interconnections
120
and
122
.
It can be seen that there is a need in the art for a solar cell that has an integrated bypass diode. It can also be seen that there is a need in the art for a solar cell that has a bypass diode that minimizes the need for additional wiring and/or metallization interconnects. It can also be seen that there is a need in the art for a bypass diode that minimizes the weight and failure points for solar cell devices.
SUMMARY OF THE INVENTION
To address the requirements described above, the present invention discloses a method, and apparatus for providing a bypass diode and solar cell string assembly. The assembly is monolithic and uses standardized semiconductor processing techniques to produce a bypass diode on the solar cell substrate.
The method comprises the steps of depositing a second layer having a first type of dopant on a first layer having an opposite type of dopant to the first type of dopant to form a solar cell, depositing a third layer having the first type of dopant on the second layer, depositing a fourth layer having the opposite type of dopant on the third layer, the third layer and fourth layer forming a bypass diode, selectively etching the third layer and the fourth layer to expose the second layer and the third layer, and applying contacts to the fourth layer, third layer, and the first layer to allow electrical connections to the assembly.
The apparatus comprises a first layer having a first type of dopant, a second layer having a second type of dopant opposite to the first type of dopant, wherein the first layer and the second layer form a solar cell, a third layer, coupled to the second layer, and a fourth layer, coupled to the third layer, the third layer and the fourth layer forming a bypass diode.
The present invention provides a solar cell that has an integrated bypass diode. The present invention also provides a solar cell that has a bypass diode that minimizes the need for additional wiring and/or metallization interconnects, as well as minimizing the weight and failure points for solar cell devices.


REFERENCES:
patent: 4638109 (1987-01-01), Ishihara et al.
patent: 4759803 (1988-07-01), Cohen
patent: 4997491 (1991-03-01), Hokuyo et al.
patent: 5248346 (1993-09-01), Frass et al.
patent: 5261969 (1993-11-01), Stanbery
patent: 5389158 (1995-02-01), Frass et al.
patent: 5461002 (1995-10-01), Safir
patent: 5580395 (1996-12-01), Yoshioka et al.
patent: 5609694 (1997-03-01), Asai
patent: 5616185 (1997-04-01), Kukulka
patent: 5665175 (1997-09-01), Safir
patent: 5990415 (1999-11-01), Green et al.
patent: 0369666 (1990-05-01), None
patent: 0535614 (1993-04-01), None
patent: 57122580 (1982-07-01), None
patent: 61067968 (1986-04-01), None
patent: 02298080 (1990-12-01), None
patent: WO9962125 (1999-12-01), None

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