Electron beam exposure system

Details Electron beam exposure system Electron beam exposure system

1992-10-30

1994-01-04

Anderson, Bruce C.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250398, 2504922, H01J 37147

Patent

active

052763315

ABSTRACT:
An electron beam exposure system having an electromagnetic lens for forming an electron beam into an arbitrary image and for condensing and projecting the image on a sample, and a plurality of saddle type electromagnetic deflectors for deflecting and scanning the electron beam on the sample, wherein at least one of the plurality of saddle type electromagnetic deflectors has a half angle of arc of more than 60 degrees and positions in a vicinity of a smooth connecting line which links four points plotted on a graph having coordinates of the half angle of arc of 60 degrees to no less than a radius of curvature of 30 millimeters, approximately 61.5 degrees to 14 millimeters, approximately 64 degrees to 9 millimeters, and approximately 66 degrees to 7 millimeters. Thus, the electron beam exposure system having the saddle type electromagnetic deflector and which is small and has low aberration is realized.

REFERENCES:
patent: 3911321 (1975-10-01), Wardly
patent: 4395691 (1983-07-01), Knauer
patent: 4431915 (1984-02-01), Nakagawa et al.
patent: 4766372 (1988-08-01), Rao
patent: 4859856 (1989-08-01), Groves et al.
patent: 4929838 (1990-05-01), Yasuda et al.
patent: 5051556 (1991-09-01), Sakamoto et al.

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