Fishing – trapping – and vermin destroying
Patent
1991-08-07
1993-12-21
Chaudhuri, Olik
Fishing, trapping, and vermin destroying
437 36, 437 44, H01L 21335
Patent
active
052721000
ABSTRACT:
A field effect transistor comprises n type impurity regions formed spaced apart on a P type semiconductor substrate to be the source.multidot.drain regions and a T-shaped gate electrode formed on the region sandwiched by the n type impurity regions with an insulating film interposed therebetween, the gate electrode being formed of upper and lower two layers with the upper layer wider than the lower layer, wherein a n type channel region is formed between the source and the drain when the prescribed voltage is applied to the T-shaped gate electrode.
REFERENCES:
patent: 4102733 (1978-07-01), De La Moneda et al.
patent: 4417385 (1983-11-01), Temple
patent: 4419809 (1983-12-01), Riseman et al.
patent: 4419810 (1983-12-01), Riseman
patent: 4430792 (1984-02-01), Temple
patent: 4577391 (1986-03-01), Hsia et al.
patent: 4745086 (1988-05-01), Parrillo et al.
patent: 4795716 (1989-01-01), Yilmez et al.
patent: 4845046 (1989-07-01), Shimbo
patent: 4907048 (1990-03-01), Huang
patent: 4908327 (1990-03-01), Chapman
patent: 4925807 (1990-05-01), Yoshikawa
patent: 4933994 (1990-06-01), Orban
patent: 4978626 (1990-12-01), Poon et al.
patent: 4985745 (1991-01-01), Kitahara et al.
patent: 5024960 (1991-06-01), Haken
patent: 5081052 (1992-01-01), Kobayashi et al.
patent: 5089863 (1992-02-01), Satoh et al.
W. Scot Ruska, Microelectronic Processing: An Introduction to the Manufacture of Integrated Circuits, McGraw-Hill Book Company (1987), Chapter 6, pp. 192-236.
Japanese J. of Appl. Physics: "Microfabrication Technique by Gas Plasma Etching Method", by H. Komiya et al., vol. 15, p. 19 (1976).
Eimori Takahisa
Ozaki Hiroji
Satoh Shin-ichi
Booth Richard A.
Chaudhuri Olik
Mitsubishi Denki & Kabushiki Kaisha
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