Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-05-15
1993-12-21
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430175, 430176, 430177, 430278, 430302, G03F 709, G03F 7021
Patent
active
052720357
ABSTRACT:
A light-sensitive composition comprising (a) a diazonium compound, (b) a polyurethane resin having a substituent group with an acidic hydrogen atom, and (c) a compound of the following general formula: ##STR1## wherein X is a single bond, --O--, --CH.sub.2 --, or --CH.sub.2 O--; Y is an alkyl group, a hydroxy group, an alkoxy group, a nitro group or a halogen atom; n is an interger of from 0 to 5; R is a hydrogen atom, an alkyl group, a phenyl group or a substituted phenyl group; and wherein, when n.gtoreq.2, Y may be the same or different.
Also disclosed is a photosensitive lithographic printing plate having a support and a light-sensitive layer deposited thereon. The light-sensitive layer comprises the above novel light-sensitive composition.
REFERENCES:
patent: 3404003 (1968-10-01), Steppan
patent: 4877711 (1989-10-01), Aoai et al.
patent: 4937170 (1990-06-01), Mohr
patent: 4980263 (1990-12-01), Sekiya
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
Young Christopher G.
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