Diazo based imaging element having improved resistance against p

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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Details

430157, 430160, 430175, 430176, G03F 711

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active

056630310

ABSTRACT:
The present invention provides an imaging element comprising on a support in the order given a coated composition of at least two hydrophilic layers being in water permeable contact with each other and each containing a hydrophilic (co)polymer or (co)polymer mixture and having been hardened with a hydrolyzed tetraalkyl orthosilicate and a light sensitive layer containing a diazo resin or a diazonium salt characterized in that the ratio by weight in the top layer of said package of said hydrophilic (co)polymer or (co)polymer mixture versus said hydrolyzed tetraalkyl orthosilicate (expressed as silicon dioxide) is at least 1.1 and the ratio by weight in an underlying layer of said package of said hydrophilic (co)polymer or (co)polymer mixture versus said hydrolyzed tetraalkyl orthosilicate (expressed as silicon dioxide) is not higher than 0.9.

REFERENCES:
patent: 4970133 (1990-11-01), Vermeersch et al.
patent: 5445912 (1995-08-01), Hauquier et al.
patent: 5462833 (1995-10-01), Hauquier et al.

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