Radiation-sensitive mixture and recording material comprising as

Details Radiation-sensitive mixture and recording material comprising as Radiation-sensitive mixture and recording material comprising as

1991-01-28

1994-01-04

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430192, 430193, 430270, 430272, 430278, 430326, 430 90, G03F 7023, G03F 730, G03C 177

Patent

active

052759083

ABSTRACT:
A positive-working radiation-sensitive mixture and recording material are disclosed. The mixture contains, as essential constituents, a 1,2-quinone diazide and/or a combination of a compound which forms strong acid on exposure to actinic radiation and a compound containing at least one cleavable C--O--C bond and a polymeric binder containing repeating units of formula I ##STR1## in which R.sub.1 is a hydrogen or halogen atom, or a cyanide or an alkyl group, R.sub.2, R.sub.3 are identical or different and are hydrogen, or alkyl or aryl groups, R.sub.4, R.sub.5 are identical or different and are and R.sub.6 hydrogen or halogen atoms, or alkyl, alkoxy or aryl groups, X represents the atoms necessary to complete a monocyclic or polycyclic carbocyclic aromatic ring system, and is 1, 2 or 3. The mixture yields lithographic plates having high print runs which can be thermally post-cured and which have good resistance to chemicals. The mixture also produces photoresists having good heat resistance.

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Abstract-83-817511/46 E14A41 MITK 31.03.82 JP 051020.

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