Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1992-04-28
1994-01-04
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430324, G03F 900
Patent
active
052758958
ABSTRACT:
A light-shielding pattern including light-shielding regions and an aperture therebetween is formed on a substrate. The substrate and the light-shielding pattern are then coated with conductive film. The conductive film is thereafter patterned, defining a conductive pattern. Next, a phase-shifting film and a resist film are deposited in this order on the substrate, the light-shielding pattern and the conductive pattern. Following this, a light beam is illuminated toward the bottom surface of the substrate and developed, thereby defining a resist pattern. The phase-shifting film is thereafter selectively etched with the resist pattern as an etching mask. As a result, a phase-shifter is obtained. Thus, the conductive pattern not only acts as an etching stopper but also prevents the substrate from getting charged. Hence, a phase-shifting mask is manufactured accurately.
REFERENCES:
patent: 4738907 (1988-04-01), Shigetomi et al.
patent: 4876164 (1989-10-01), Watakabe et al.
patent: 4895779 (1990-01-01), Yoshioka et al.
patent: 5045417 (1991-09-01), Okamoto
patent: 5085957 (1992-02-01), Hosono
patent: 5153083 (1992-10-01), Garofalo et al.
Chapman Mark A.
McCamish Marion E.
Mitsubishi Denki & Kabushiki Kaisha
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