Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1996-10-21
1999-02-23
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
356401, G03F 900
Patent
active
058741909
ABSTRACT:
A process for projection exposure in which, using alignment marks on the back of a workpiece, positioning of the mask to the workpiece is performed, and a device for executing the process is achieved by the fact that exposure light is emitted from an exposure light irradiation device without the workpiece being in place. Images of alignment marks of the mask are imaged on image sensors of alignment units, and by an image processing part positions thereof are determined. According to the invention, then, a workpiece is placed on a workpiece carrier, light is emitted from alignment light irradiation devices and positions of the alignment marks of the workpiece are determined. Furthermore, the workpiece carrier is moved by the carrier drive device such that the alignment marks of the mask and workpiece come to rest on top of one another, and thus positioning of the mask to the workpiece is done. Then the exposure surface of the workpiece and the imaging position of the mask are brought into agreement with one another, exposure light is emitted from the exposure light irradiation device, and the workpiece is exposed.
REFERENCES:
patent: 3709579 (1973-01-01), Makosch
patent: 3950094 (1976-04-01), Kano et al.
patent: 4798470 (1989-01-01), Moriyama et al.
patent: 4952060 (1990-08-01), Ina et al.
Patent Abstracts of Japan, vol. 017, No. 525, (E-1436), Sep. 21, 1993 & JP 05 144702 A (Hitachi Ltd) Jun. 11, 1993, *Abstract, Figure 7*.
Patent Abstracts of Japan, vol. 013, No. 435, (E-825), Sep. 28, 1989 & JP 01 164032 A (Olympus Optical Co. Ltd.) Jun. 28, 1989, *Abstract*.
Patent Abstracts of Japan, vol. 016, No. 038, (E-1161), Jan. 30, 1992 & JP 03 246923 a (Hitachi Ltd.), Nov. 5, 1991, *Abstract*.
Patent Abstracts of Japan, vol. 009, No. 225, (E-342), Sep. 11, 1985 & JP 60 083329 A (Fujitsu KK), May 11, 1985, *Abstract*.
Safran David S.
Ushiodenki Kabushiki Kaisha
Young Christopher G.
LandOfFree
Process for projection exposure of a workpiece with back alignme does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for projection exposure of a workpiece with back alignme, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for projection exposure of a workpiece with back alignme will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-305170