Method and apparatus for measuring underdeposit localized corros

Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204404, G01N 2726

Patent

active

052757048

ABSTRACT:
A method and apparatus is provided for measuring underdeposit localized corrosion rate of a metal structure under differential flow conditions encountered in actual cooling water systems. A first electrode defining a slow flow electrode is immersed in an electrolytic liquid. A second electrode defining a fast flow electrode is also immersed in the electrolytic liquid. Different fluid dynamic conditions are created on the slow flow and fast flow electrodes. There are three (3) techniques for obtaining measurement from a differential flow cell so as to determine the underdeposit localized corrosion rate due to differential flow conditions. In one embodiment, the different fluid dynamic conditions are created by rotating the slow flow electrode at a first speed and by rotating the fast flow electrode at a second speed which is higher than the first speed.

REFERENCES:
patent: 3660249 (1972-05-01), Townsend
patent: 3878064 (1975-04-01), Weisstuch et al.
patent: 4395318 (1983-07-01), Tait et al.
patent: 4994159 (1991-02-01), Agarwaza et al.
patent: 5045775 (1991-09-01), White et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for measuring underdeposit localized corros does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for measuring underdeposit localized corros, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for measuring underdeposit localized corros will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-304281

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.