Method and apparatus for causing plasma reaction under atmospher

Details Method and apparatus for causing plasma reaction under atmospher Method and apparatus for causing plasma reaction under atmospher

1991-10-15

1994-01-04

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

C23C 1650

Patent

active

052756653

ABSTRACT:
The apparatus of the present invention comprises a reaction vessel, and disposed within this vessel, a pair of opposed electrodes. The opposed electrodes comprise an upper electrode and a lower electrode which are spaced apart a suitable distance for receiving the substrate. The lower electrode has an upper surface covered with a solid dielectric. The upper electrode may have its lower surface covered with a solid dielectric, or it may be composed of a plurality of fine wires. Near the spaced apart electrodes are a plurality of gas outlets for uniformly dispersing the reaction gas between the spaced apart electrodes.
The method of the present invention comprises introducing a reagent gas or a mixture of a reagent gas and a rare gas or an inert gas into the reaction vessel, exciting the gas to produce a glow discharge plasma under atmospheric pressure, and treating the surface of the substrate with the plasma.

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patent: 4534816 (1985-08-01), Chen
patent: 4616597 (1986-10-01), Kaganowicz
patent: 4673588 (1987-06-01), Bringman
patent: 4767641 (1988-08-01), Kieser
patent: 4780169 (1988-10-01), Stark
patent: 4844945 (1989-07-01), Bhaskar
patent: 5022979 (1991-06-01), Hijikata
patent: 5031571 (1991-07-01), Igarashi

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