Substrate slew circuit process

Details Substrate slew circuit process Substrate slew circuit process

1993-02-22

1994-08-30

Quach, T. N.

Fishing, trapping, and vermin destroying

437 40, 437 41, 437 45, 3072962, H01L 21335

Patent

active

053427998

ABSTRACT:
The described embodiments of the present invention provide a substrate slew circuit that eliminates electron injection. The slew circuit comprises a semiconductor substrate, at least one transistor and a control circuit. One of source/drain of a first transistor (26) in the slew circuit is connected to Vss, the other of the source/drain of the first transistor (26) is connected to the substrate, or in another embodiment of the invention, to one of a source/drain of a second transistor (28), the gate and other of the source/drain of the second transistor (28) being connected to the substrate. A control circuit is connected to the gate of the first transistor for controlling the passage of voltage from the one of a source/drain of the first transistor (26) to the substrate via the gate and the one of a source/drain of the second transistor (28). The sensitivity of the slew circuit can be made programmable by adding p-channel transistors in stacked diode configuration between the other of the source/drain of the first transistor (26) and the substrate.

REFERENCES:
patent: 4736121 (1988-04-01), Cini et al.
patent: 5120993 (1992-06-01), Tsay et al.
patent: 5202588 (1993-04-01), Matsuo et al.

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