Photosensitive copying composition

Details Photosensitive copying composition Photosensitive copying composition

1978-09-18

1981-05-05

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430193, 260141, C07C11302, G03C 152

Patent

active

042660009

ABSTRACT:
This invention relates to a photosensitive copying composition comprising a solvent and a naphthoquinone-(1,2)-diazidesulfonic acid ester as the photosensitive compound, said naphthoquinone diazide sulfonic acid ester having the general formula I ##STR1## wherein: X is a single bond or one of the groups ##STR2## R.sup.1, R.sup.1' and R.sup.1" are the same or different and are H or D, R.sup.2 and R.sup.2' are the same or different and are H or halogen,

REFERENCES:
patent: 3046119 (1962-07-01), Sus
patent: 3046121 (1962-07-01), Schmidt
patent: 3106465 (1963-10-01), Neugebauer et al.
patent: 3130047 (1964-04-01), Uhlig et al.
patent: 3188210 (1965-06-01), Fritz et al.
patent: 3640992 (1972-02-01), Sus et al.

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