Electrophotographic photosensitive member and process for produc

Details Electrophotographic photosensitive member and process for produc Electrophotographic photosensitive member and process for produc

1978-12-19

1981-05-05

Martin, Jr., Roland E.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 65, 430 67, 430 84, 430 95, 430133, 430156, 204192P, 2525011, G03G 5082

Patent

active

042659914

ABSTRACT:
A layer of amorphous silicon containing H, preferably 10-40 atomic %H, is used as a photoconductive layer for electrophotographic photosensitive member.

REFERENCES:
patent: 3617354 (1971-11-01), Carnahan et al.
patent: 3691104 (1972-09-01), Hanada
patent: 4059461 (1977-11-01), Fal et al.
patent: 4162505 (1979-07-01), Hanak
Moustakas et al., "Preparation of Highly Photoconductive Amorphous Silicon by rf Sputtering," Solid State Comm., vol. 23, No. 3, pp. 155-158, Jul. 1977.
Thompson et al., "R.F. Sputtered Amorphous Silicon Solar Cells," Proc. Int'l. Photovoltaic Solar Energy Conf., Sep. 1977, Riedel Publ. Co., pp. 231-240.

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