Photoresist composition of cocondensed naphthol and phenol with

Details Photoresist composition of cocondensed naphthol and phenol with Photoresist composition of cocondensed naphthol and phenol with

1983-11-07

1985-11-05

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430167, 430197, 430325, 430326, G03C 160, G03C 171, G03F 726

Patent

active

045514097

ABSTRACT:
A photoresist composition comprising a sensitizer in a binder that is a naphthol polymer alone or mixed with another compatible resin such as a novolak resin or a polyvinyl phenol. The use of the naphthol resin as a portion of the binder increases the heat distortion temperature of the photoresist composition.

REFERENCES:
patent: 3634082 (1972-01-01), Christensen
patent: 3859099 (1975-01-01), Petropoulos
patent: 3868254 (1975-02-01), Wemmers
patent: 3869292 (1975-03-01), Peters
patent: 4123279 (1978-10-01), Kobayashi
patent: 4250242 (1981-02-01), Doering
patent: 4404357 (1983-09-01), Taylor et al.

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