Drying and gas or vapor contact with solids – Apparatus – Houses – kilns – and containers
Reexamination Certificate
1999-12-15
2002-08-13
Doerrler, William C. (Department: 3744)
Drying and gas or vapor contact with solids
Apparatus
Houses, kilns, and containers
C034S217000, C034S236000, C034S242000, C034S417000, C034S480000, C034S087000, C134S061000, C134S082000, C414S217000, C414S939000, C198S495000
Reexamination Certificate
active
06430839
ABSTRACT:
FIELD OF THE INVENTION
The present invention relates to an assembly line in a clean room, and particularly, the present invention relates to an assembly line located in the clean room of a semiconductor assembly plant, in which a high degree of cleanliness is required.
BACKGROUND OF THE INVENTION
Referring to
FIG. 5
, a semiconductor assembly line for manufacturing semiconductor devices is installed in a clean room
100
. The assembly line includes many facilities such as a variety of manufacturing apparatuses
110
and measuring apparatuses
111
used to manufacture the semiconductor devices. The clean room is mainly made up of a first area
101
in which the apparatuses are located, and a second area
102
in which control units
120
for controlling the apparatuses are located and where workers
130
manage the control units
120
. In the first area
101
, generally, an automatic transport system
112
, for example a transport robot, is used.
The clean room
100
requires a special high degree of cleanliness, particularly in the first area
101
. Workers that enter the clean room
100
must first take an air shower while wearing dust free garments, dust free gloves, a dust free mask and clean shoes. If dust is somehow introduced into the clean room
100
, the semiconductor devices manufactured in the clean room
100
may be defective.
It takes enormous cost and labor to manufacture a clean room maintain the cleanliness of the clean room. Particularly manufacturing and maintaining the first area
101
of the clean room is very expensive. Also, the larger the clean room, the more burdensome are the costs and labor.
SUMMARY OF THE INVENTION
The object of the invention is to provide a relatively inexpensive assembly system located in a clean room having a high degree of cleanliness.
To achieve the object, in the typical invention of the present application, a transporting enclosure arranged between first apparatus and second apparatus, all located in a clean room, is shielded from the clean room and maintained a second clean level cleaner than that of the clean room.
According to the present invention, the cleanest area, such as the first area, is minimized in the clean room. As the cleanest area which is the most expensive to manufacture, is minimized, it can be realized to manufacture the clean room more inexpensively than the conventional clean room.
REFERENCES:
patent: 4649830 (1987-03-01), Tanaka
patent: 4682927 (1987-07-01), Southworth et al.
patent: 4826360 (1989-05-01), Iwasawa et al.
patent: 4923352 (1990-05-01), Tamura et al.
patent: 5058491 (1991-10-01), Wiemer et al.
patent: 5470784 (1995-11-01), Coleman
patent: 5928077 (1999-07-01), Kisakibaru
patent: 11-016976 (1999-01-01), None
patent: 11-016984 (1999-01-01), None
patent: 11-024750 (1999-01-01), None
patent: 11-044443 (1999-02-01), None
Doerrler William C.
Oki Electric Industry Co. Ltd.
Shulman Mark
Volentine & Francos, PLLC
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