Flow modification devices for reducing emissions from thermal vo

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

422176, 422180, 422201, 422203, 431 5, 431 7, 431215, 110210, 110214, F01N 324, F23D 1144

Patent

active

054277469

ABSTRACT:
A method and apparatus for reducing the emissions from a thermal oxidizer for volatile organic compounds (VOC) containing waste gases. The waste gas is treated in a thermal reactor and either before, in or after the thermal reactor the waste gas is contacted with a catalyzed surface device in the gas stream within the thermal oxidizer. The catalyzed surface device has a catalyzed surface which contacts the waste gas and further oxidizes the waste gas.

REFERENCES:
patent: 3808806 (1974-05-01), Nakamura
patent: 3854288 (1974-12-01), Heitland
patent: 3947545 (1976-03-01), Ishida
patent: 4318894 (1982-03-01), Hensel et al.
patent: 4725411 (1988-02-01), Cornelison
patent: 4820500 (1989-04-01), Obermuller
patent: 4850857 (1989-07-01), Obermuller
patent: 4991396 (1991-02-01), Goerlich et al.
patent: 5150573 (1992-09-01), Maus et al.
patent: 5209062 (1993-05-01), Vollenweider
patent: 5320523 (1994-06-01), Stark

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Flow modification devices for reducing emissions from thermal vo does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Flow modification devices for reducing emissions from thermal vo, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Flow modification devices for reducing emissions from thermal vo will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-285283

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.