Plasma processing system using surface wave plasma generating ap

Details Plasma processing system using surface wave plasma generating ap Plasma processing system using surface wave plasma generating ap

1993-02-19

1995-02-14

Lee, Benny T.

Coating apparatus

Gas or vapor deposition

With treating means

118723ME, 118723IR, 118723MW, 315111210, 315111510, C23C 1650, H05H 146

Patent

active

053891538

ABSTRACT:
A surfatron 12 is provided which includes first waveguide 32 coupled to a section of coaxial waveguide 30 to define a cavity 28 at the intersection therebetween. The coaxial waveguide 30 includes an outer cylinder 36 and an inner cylinder 34 disposed within the outer cylinder 36. Inner cylinder 34 has an end disposed proximate to a wall of first section of waveguide 32. A space 40 is defined between the end of inner cylinder 34 and the wall of waveguide 32. A discharge tube 22 is provided having a first portion disposed within inner cylinder 34 and a second portion extending through space 40 between the end of inner cylinder 34 and the wall of waveguide 32. A coil 38 is disposed around the portion of discharge tube 22 extending through space 40 between the end of inner cylinder 34 and the wall of waveguide 32.

REFERENCES:
patent: 4611108 (1986-09-01), Leprince et al.
patent: 4810933 (1989-03-01), Moisan et al.
patent: 4908492 (1990-03-01), Okamoto et al.
patent: 4933650 (1990-06-01), Okamoto
patent: 5028847 (1991-07-01), Greb et al.
patent: 5063329 (1991-11-01), Okamoto
patent: 5086255 (1992-02-01), Okamoto et al.
1987 American Institute of Physics, Rev. Sci. Instrum 58 (10) Oct. 1987, "New Surface Wave Launchers for Sustaining Plasma Columns at Submicrowave Frequencies (1-300 MHz)" by M. Moisan and Z. Zakrzewski, pp. 1895-1900.

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